Wafer-level Monolithic Hybrid Integration: a mass manufacturable approach towards high performance microLED micro-Displays
Presenter: Fang Ou, CTO, Hong Kong Beida Jade Bird Display (JBD) Ltd.
Abstract: Micro-display technology is experiencing a revolution. Distinguishing itself from existing micro-display technologies, microLED micro-display technology aims at directly integrating tiny micron size LEDs, namely microLEDs, as pixel elements onto the Si driver IC backplane. Pairing the excellent light emission capabilities of compound semiconductor devices with the unsurpassed functionalities of ICs will lead to microLED micro-displays with significant performance improvements, overcoming limitations of other competing micro-display technologies and promising enormous emerging applications. The presentation will introduce the wafer-level monolithic hybrid integration technology invented by JBD which holds the key to realize high-volume manufacture of high performance microLED micro-displays. Encouraging progress in microLED micro-displays fabricated using the monolithic hybrid integration technology will be presented and potential applications of those microLED micro-displays will be discussed.
Bio: Dr. Fang Ou holds Ph.D. in Electrical Engineering from Northwestern University, Evanston, IL, USA and M.S. and B.S. in Electrical Engineering from Shanghai Jiao Tong University, Shanghai, China. He has more than 13 years of extensive R&D experience on semiconductor optoelectronics and fiber optics from both research institutions and technology companies including JBD, ChangYou.com, Emcore Corporation, Skorpios Technologies and Argonne National Laboratory. Dr. Fang Ou joined JBD in 2015 as one of co-founders where he currently serves as CTO in the company. At JBD, he led the R&D team and developed the monolithic hybrid integration technology which led to the successful demonstration of microLED micro-displays with ultra-high brightness and ultra-high resolution. Before joining JBD, Dr. Fang Ou involved in a broad range of R&D works in the field of optoelectronics including 1310nm and 1550nm FP and DFB lasers, high speed EO modulators, Si photonics, transparent conductive oxide material engineering, nano-scale lasers and plasmonic devices, etc. He has published more than 30 papers in peer-reviewed scientific journals and conferences.